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An Investigation on the electrochemical behavior of the co/cu multilayer system

Mahshid, S. S ; Sharif University of Technology | 2010

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  1. Type of Document: Article
  2. DOI: 10.1166/jnn.2010.2593
  3. Publisher: 2010
  4. Abstract:
  5. Co/Cu multilayers were deposited in a sulfate solution by controlling the current and potential for the deposition of cobalt and copper layer respectively. The electrochemical behavior of these multilayers was studied by cyclic voltammetry and current transients. In addition, a mathematical analysis was used to characterize the electrodeposition system. Simultaneously, the nucleation and growth mechanisms were monitored by these techniques. In this case, the results clearly showed that electrodeposition of cobalt layers was a kinetically controlled process while the reduction of copper ions was a diffusion-control process. Although nucleation mechanism of the single Co deposit was found as a progressive system, it was found as an instantaneous system with three-dimensional growth mechanism in the Co/Cu bilayer deposition. Atomic Forced Microscopy images of the Co/Cu multilayer also confirmed the aforementioned nucleation mechanism, where it was expected that the growth of multilayer films would form a laminar-type structure containing a large number of equally-sized rounded grains in each layer
  6. Keywords:
  7. Electrodeposition ; [Co/Cu] ; Bilayer deposition ; Co-deposits ; Co/Cu multilayers ; Cobalt layers ; Control process ; Controlled process ; Copper ions ; Copper layer ; Current transients ; Electrochemical behaviors ; Mathematical analysis ; Microscopy images ; Nucleation and growth ; Nucleation mechanism ; Progressive systems ; Sulfate solutions ; Three-dimensional growth ; Type structures ; Amorphous alloys ; Cobalt ; Cobalt deposits ; Cyclic voltammetry ; Electrodeposition ; Metal ions ; Multilayer films ; Nucleation ; Power quality ; Process control ; Multilayers
  8. Source: Journal of Nanoscience and Nanotechnology ; Volume 10, Issue 9 , September , 2010 , Pages 5964-5970 ; 15334880 (ISSN)
  9. URL: http://www.ingentaconnect.com/content/asp/jnn/2010/00000010/00000009/art00066