Sharif Digital Repository

Electrodeposition of the Co-Ni/Cu multilayer films was carried out in sulfate solution. Cyclic voltammetry and current transient techniques were utilized to characterize the multilayer system and to obtain the nucleation and growth mechanism. The cyclic voltammograms clearly showed that electrodeposition of cobalt-nickel alloy layer was controlled by a kinetic process, where copper ions were reduced under diffusion-controlled mechanism. In addition, the current transients revealed that nucleation mechanism was instantaneous with a typical three-dimensional growth process. The microstructure of the Co-Ni/Cu films was also changed with overpotential. In this system, the growth of multilayer... 

The electrodeposition of cobalt, nickel and Ni-Co alloys was studied by electrochemical techniques. Cyclic voltammetry and current transient measurements were used to characterize the Co-Ni system in other to obtain the nucleation and growth mechanism. The cyclic voltammetry results clearly showed that electrodeposition of cobalt, nickel and Co-Ni alloy is diffusion-controlled process with a typical nucleation mechanism. The redox potentials of the Co and Ni are shifted to more cathodic potentials in the Co-Ni alloy system. In addition, the current transients revealed that nucleation mechanism is instantaneous with a typical three-dimensional (3D) nucleation and growth process. The number of... 

TiO2 a nanotube array was prepared using an anodization process. The process proceeded in a two-electrode cell containing of platinum sheet as the cathode electrode. Two phosphate-base electrolyte solutions containing different amounts of HF and NH4F were prepared. Different concentration of fluorine ions were examined in respected electrolytes. Current transient techniques were used to produce the TiO2 nanotubes at constant voltage of 18-25V. It was revealed that anodization at 18-22V, in so-called electrolytes would end up to nano-tubular structure. However the tubular structure prepared at 20V and from phosphate electrolyte containing of 0.5 wt% NH4F as well as 0.5 wt% HF, was recognized... 

The electrodeposition of nickel was studied using electrochemical techniques in different electrolytes and various agents. The voltammetry analysis clearly showed that the electrodeposition of nickel was a diffusion-controlled process associated with a typical nucleation process. The current transients represented instantaneous nucleation with a typical three-dimensional (3D) growth mechanism. Scharifker's equations were derived for instantaneous and progressive nucleation of the 3D growth of the spherical centers under diffusion-controlled condition. The number of nucleation sites increased with the increment in overpotential and Ni 2+ concentration. Atomic force microscopy was used to... 

Co/Cu multilayers were deposited in a sulfate solution by controlling the current and potential for the deposition of cobalt and copper layer respectively. The electrochemical behavior of these multilayers was studied by cyclic voltammetry and current transients. In addition, a mathematical analysis was used to characterize the electrodeposition system. Simultaneously, the nucleation and growth mechanisms were monitored by these techniques. In this case, the results clearly showed that electrodeposition of cobalt layers was a kinetically controlled process while the reduction of copper ions was a diffusion-control process. Although nucleation mechanism of the single Co deposit was found as a... 

Electrodeposition of gold nanowires is carried out in cyanide solution in polycarbonate templates with pore diameter of 80 nm. Electrochemical methods are utilized to characterize the gold electrodeposition and to obtain the nucleation and growth mechanism. The analysis of cyclic voltammograms shows that the electrodeposition of gold nanowires takes place under diffusion control. Current transients reveal that nucleation mechanism is instantaneous with a three-dimensional growth process. The transition-time measurements show that the gold elecrodeposition occurs as one-electron valence involved in the reaction mechanism. Charge transfer coefficient is also found to be 0.67 ± 0.01. The value... 

Electrochemical deposition of aluminum and manganese from basic and acidic molten AlCl3-NaCl-KCl mixture on an aluminum electrode at 180 °C was studied by the methods of voltammetry, and potential and current transient. The deposition of aluminum was found to proceed via a nucleation/growth mechanism in basic melt, while the deposition of manganese was found to be diffusion controlled in basic melt. The diffusion coefficient of Mn2+ ions in basic melt, as derived by voltammetry was in agreement with the deductions of transient methods. Analysis of the chronoamperograms indicates that the deposition of manganese on Al was controlled by 3D diffusion controlled nucleation and growth. The... 

Electrochemical deposition of aluminum and lead from basic molten AlCl3-NaCl-KCl mixture on an aluminum electrode at 180 °C was studied by the methods of voltammetry, potential and current transient and constant current deposition. The deposition of aluminum was found to proceed via a nucleation/growth mechanism, while the deposition of lead was found to be diffusion controlled. The diffusion coefficient calculated for Pb2+ ions in basic melt by voltammetry was in agreement with the deductions of transient method. The analysis of the chronoamperograms indicates that the deposition process of lead on Al substrates was controlled by 3D diffusion control, nucleation and growth. The processes...