Sharif Digital Repository

A compact aging model for circuit simulation has been developed by considering all possible trapped carriers within MOSFETs. The hot carrier effect and the N(P)BTI effect are modeled by integrating the substrate current as well as the oxide field change due to the trapped carriers. Additionally, the carriers trapped within the highly resistive drift region are included for high-voltage (HV)-MOSFET modeling. The aging model considers the dynamic trap-density increase as a function of circuit-operation time with dynamically varying stress conditions for each individual MOSFET. A self-consistent solution is obtained by iteratively solving the Poisson equation including the trap density. The... 

It is shown that a compact MOSFET-aging model for circuit simulation is possible by considering the dynamic trap-density increase, which is induced during circuit operation. The dynamic trap/detrap phenomenon, which influences the switching performance, is also considered on the basis of well-known previous results. Stress-dependent hot-carrier effect and NBTI effect, origins of the device aging, are modeled during the circuit simulation for each device by integrating the substrate current as well as by determining the oxide-field change due to the trapped carriers over the individual stress-duration periods. A self-consistent solution can be obtained only by iteratively solving the Poisson... 

We have developed a simulation system for nanoscale high-electron mobility transistors, in which the self-consistent solution of Poisson and Schrödinger equations is obtained with the finite element method. We solve the exact set of nonlinear differential equations to obtain electron wave function, electric potential distribution, electron density, Fermi surface energy and current density distribution in the whole body of the device. For more precision, local dependence of carrier mobility on the electric field distribution is considered. We furthermore compare the simulation to a recent experimental measurement and observe perfect agreement. We also propose a novel graded channel design,... 

For the first time, we present self-consistent solution of ultrathin body device structures to investigate the device parameters variation on the characteristics of nanoscale MOSFET. Our two dimensional (2-D) device simulator Is based on Nonequlibrium Green's Function (NEGF) forma lism. Starting from a basic structure (DG-MOSFET) with a gate length of 10 nm, variation of gate length, channel thickness, gate oxide parameters was carried out in connection with the numerical calculation of device characteristics. In this work Quantum transport equations are solved in 2-D by NEGF method in active area of the device to obtain the charge density and Poisson's equation is solved in entire domain of...