Sharif Digital Repository

In this study, we have used a low temperature plasma, produced by a DC magnetron sputtering device, for decolorizing of denim fabrics, and the effect of using different gases such as Argon and Oxygen as the discharge medium have been investigated. The results obtained under equal periods of time have been compared and the effect of washing on the treated denims has been reported. © 2006 Elsevier B.V. All rights reserved  

This study aims at investigating the effect of the substrate material on growth mechanism and also microstructure of Ta2O5 thin films. For this purpose, atomic force microscopy, scanning electron microscopy, and interferometry analyses were implemented to reveal the influence of silicon wafer and amorphous BK7 glass substrates on the nucleation and growth mechanisms of Ta2O5 thin films deposited via the radio frequency magnetron sputtering technique. Results indicated that those films with finer morphologies had relatively higher nucleation densities. Compared with BK7 glass substrate, crystals formed on the silicon wafer were shown to be finer and had lower mean areas in more nucleation... 

Investigation of BSCCO 2223 phase formation in superconducting thin films of Bi-based cuprates deposited on MgO substrate is reported. A series of films were made by in situ dc-magnetron sputtering method and another series were made by ex situ rf-magnetron sputtering technique. Same target have been used in both technique. In the case of the ex situ method, the films were annealed for different period of time at 800°C, and in the case of in situ method, the films were deposited at different temperature substrate. The influence of annealing time and the temperature of the substrate on the quality and the phase formation for ex situ and in situ method have studied, respectively. The results... 

The effect on the thermal parameters of superconducting transition-edge bolometers produced on a single crystalline SrTiO3 (STO) substrate with and without a CeO2 buffer layer was investigated. Metal-organic deposition was used to deposit the 20-nm CeO2 buffer layer, whereas RF magnetron sputtering was applied to fabricate 150-nm-thick superconducting YBa2Cu3O7-δ (YBCO) thin film. The critical transition temperature for both of the YBCO films was 90 K, and the transition width was ∼1.9 K. The bolometers fabricated from these samples were characterized with respect to the voltage phase and amplitude responses, and the results were compared with that of simulations conducted by applying a... 

High temperature shape memory NiTiHf thin films with varying hafnium contents up to 28.7 at.% were fabricated by DC magnetron sputtering using simultaneous sputter deposition from separate elemental targets. The required film composition was achieved by adjusting the power ratio to the targets. The as-deposited films were amorphous; a post deposition annealing was performed at 550 °C to crystallize the films. Two-micron thick films were characterized by energy dispersive spectroscopy in a scanning electron microscope, temperature controlled X-ray diffraction, differential scanning calorimetry, and atomic force microscopy. The results showed that above 10 at.% Hf additions the transformation... 

Formation and thermal stability of nanothickness NiSi layer in Ni(Pt 4 at.%)/Si(1 0 0) and Ni0.6Si0.4(Pt 4 at.%)/Si(1 0 0) structures have been investigated using magnetron co-sputtering deposition method. Moreover, to study the effect of Si substrate in formation of NiSi and its thermal stability, we have used Ta diffusion barrier between the Ni0.6Si0.4 layer and the Si substrate. Post annealing treatment of the samples was performed in an N2 environment in a temperature range from 200 to 900 °C for 2 min. The samples were analyzed by four point probe sheet resistance (Rs) measurement, X-ray diffraction (XRD) and atomic force microscopy (AFM) techniques. It was found that the annealing... 

In this article, we have studied the properties (especially water repellency) of cotton coated by a thin layer of aluminum. The process has been performed in a low temperature plasma medium, using a magnetron sputtering device. We have also investigated the effect of different gases such as argon and oxygen as the discharge medium on the properties of the obtained samples. The results which are exposure time dependent show a good repellent property for 30 min of treating in argon medium under the condition of our experiment. However, when O2 is used in the system, the cotton property changes to become hydrophilic of which the factor decreases as we increase the time of treating. © 2006... 

The morphology, structure and optical properties of zinc sulfide (ZnS) thin films prepared through radio-frequency (RF) magnetron sputtering have been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry, X-ray diffraction, and multifractal analyses. The X-ray diffraction patterns revealed that all ZnS thin films show a single peak at around 29.6°, which has been ascribed to the (111) planes of sphalerite phase, indicating that the growth direction of the films is the [111] direction. UV–Vis–NIR transmittance spectra were used to determine the refractive index of the samples, their thickness, and their band gap energy, showing the optical and semiconductor properties a... 

This study aims at investigating the effect of the substrate material on growth mechanism and also microstructure of Ta2O5 thin films. For this purpose, atomic force microscopy, scanning electron microscopy, and interferometry analyses were implemented to reveal the influence of silicon wafer and amorphous BK7 glass substrates on the nucleation and growth mechanisms of Ta2O5 thin films deposited via the radio frequency magnetron sputtering technique. Results indicated that those films with finer morphologies had relatively higher nucleation densities. Compared with BK7 glass substrate, crystals formed on the silicon wafer were shown to be finer and had lower mean areas in more nucleation... 

In this work, formation of gold nanoparticles in radio frequency (RF) reactive magnetron co-sputtered Au-SiO 2 thin films post annealed at different temperatures in Ar + H 2 atmosphere has been investigated. Optical, surface topography, chemical state and crystalline properties of the prepared films were analyzed by using UV-visible spectrophotometry, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and X-ray diffractometry (XRD) techniques, respectively. Optical absorption spectrum of the Au-SiO 2 thin films annealed at 800 °C showed one surface plasmon resonance (SPR) absorption peak located at 520 nm relating to gold nanoparticles. According to XPS analysis, it was... 

In the present paper, the fabrication and characterisation of typical high temperature Ni(Ti+ Hf) alloyed thin films produced by simultaneous sputter deposition from separate elemental Ni, Ti and Hf targets are presented. Film composition, determined by energy dispersive X-ray spectroscopy, was controlled by adjusting the ratio of powers applied to each target. Films deposited at room temperature had an amorphous structure and subsequent annealing at 550°C was carried out in a high vacuum environment, based on crystallisation temperature evaluation by differential scanning calorimetry (DSC). High temperature martensitic transformation, confirmed by DSC and variable temperature X-ray... 

The present paper demonstrates the performance of the radiation grafting technique as a chemically based surface pretreatment method to adhesion modification of polyethylene surfaces toward the metallic layer. Gamma irradiation over a dose range of 4-10 kGy is used for grafting of vinyl monomers including acrylamide (AAm) and 1-vinyl-2-pyrrolidone (NVP) onto the surface of three different polyethylenes including low density polyethylene (LDPE) and two kinds of high density polyethylenes, namely HDPE-1 and HDPE-2. The grafting yield is evaluated based on the weight increase of the samples. It is found that the grafting yield is dominated by the crystallinity of the polyethylene, so that lower... 

The fabrication of TixNi1-x shape memory films using simultaneous magnetron sputtering from two separate, elemental targets was investigated. The films were deposited at room temperature and then annealed at 500 °C to achieve the shape memory effect. The influence of sputtering parameters such as power ratio to the targets (to control the composition) and Ar gas pressure (to control the film structure) were studied. It was found that the Ar gas pressure had a critical influence on the shape memory effect of the films. Characterization of the films was carried out by energy dispersive X-ray spectroscopy in a scanning electron microscope (to measure the film composition and uniformity), in... 

We have investigated the effect of bias voltage on sheet resistance, surface roughness and surface coverage of Co/NiO x magnetic bilayer. In addition, interface topography and corrosion resistance of the Ta/Co/Cu/Co/NiO x /Si(1 0 0) system have been studied for Co layers deposited at an optimum bias voltage. Atomic force microscopy (AFM) and four point probe sheet resistance (Rs) measurement have been used to determine surface and electrical properties of the sputtered Co layer at different bias voltages ranging from 0 to -80 V. The Co/NiO x bilayer exhibits a minimum surface roughness and low sheet resistance value with a maximum surface coverage at Vb=-60 V resulted in a slight increase of... 

Progress in tissue engineering and regenerative medicine necessitates the use of novel materials with promising bio-surface for biomedical applications. In this work, TixNy thin films are applied on biological TC4 substrates in a mixed atmosphere of Ar and N2 via magnetron sputtering system for the protection of TC4 alloy. The effects of N/Ti ratio on the phase structure, growth orientation, contact angle, and the mechanical and corrosion performances of thin films are discussed by implementation of composition-microstructure-property interrelationships. The phase structure of TixNy thin films is changed from amorphous-like to single phase Ti2N structure with increasing N/Ti ratio. In the... 

In planar perovskite solar cells (PSCs), engineering the extraction and recombination of electron–hole pairs by modification of the electron transport layer (ETL)/perovskite interface is very vital for obtaining high performance. The main idea here is to improve properties of the TiO2/perovskite interface by inserting an ultra-thin layer (UTL) of WO3 or SnO2 with the thickness of less than 10 nm by RF magnetron sputtering method. The structural and electrical characteristics of the samples were tested by XRD, AFM, FE-SEM, Mott-Schottky analysis, UV–Vis spectroscopy, J-V characterization and electrochemical impedance spectroscopy (EIS). It was found that the bilayer structured ETLs exhibit... 

In this study, we investigate the use of catalytic copper-silver-palladium substrates for the growth of multiwalled carbon nanotubes via the thermal chemical vapor deposition. These layers are comprised of nanocrystals of Cu2O, CuO, Ag, Pd, Cu, and PdO and were grown using a DC magnetron sputtering method. Scanning electron microscopy characterizations confirmed the significant growth of carbon nanotubes on the catalytic layer. A comparison of the growth of nanotubes indicated that the thickness of the catalytic layers has a significant impact on the quality and the diameter of the carbon nanotubes. Two major peaks were seen in the Raman spectrum. The formation of graphite multiwalled... 

In this research, titanium dioxide (TiO2) ultra-thin films have been successfully obtained on lamina-glass substrates by thermal oxidation of DC magnetron sputtered titanium. The as-deposited and the annealed films have been characterized by different techniques. The X-ray diffraction (XRD) results revealed the amorphous structure of as-deposited titanium and anatase crystal structure for the annealed films. The atomic force microscopy (AFM) results showed that increasing the annealing temperature could lead to rougher and larger grain size in the films. Finally, the optical data and band-gap calculations of the films were obtained using the transmittance spectrum, indicating that... 

In this research, the effect of Ni, Pd and Ni-Pd catalysts have studied on morphology and structure of synthesized multi-wall carbon nanotubes (MWCNTs). Initially, thin films of Ni (with two thicknesses of 10 and 20 nm), Pd/Ni (5/10 nm) and Pd (10 nm) were deposited as catalysts on SiO 2 (60 nm)/Si(1 0 0) substrates, using dc magnetron sputtering technique. The deposited films were annealed at 900 °C in ammonia environment for 45 min, in order to obtain nano-structured catalyst on the surface. Using scanning electron microscopy (SEM), the average size of Ni nano-islands (synthesized by the 10 and 20 nm Ni films), Pd and Ni-Pd nano-islands were measured about 55, 110, 45 and 50 nm,... 

We have studied formation of Au-Ag alloy nanoparticles in sputtered SiO 2 thin films. Silica thin films containing Au-Ag nanoparticles were deposited on quartz substrates using rf reactive magnetron co-sputtering technique. The films heat-treated in reducing Ar + H 2 atmosphere at different temperatures. They were analyzed by using UV-vis spectrophotometry, atomic force microscopy and X-ray photoelectron spectroscopy (XPS) methods for their optical, surface morphological as well as structural and chemical properties. The optical absorption of the Au-Ag alloy nanoparticles illustrated one plasmon resonance absorption peak located at 450 nm between the absorption bands of pure Au and Ag...